Fast model-based optical proximity correction

Photocopying – Projection printing and copying cameras – Illumination systems or details

Reexamination Certificate

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C355S069000, C355S053000, C716S030000

Reexamination Certificate

active

07079223

ABSTRACT:
A method and system is provided for computing lithographic images that may take into account non-scalar effects such as lens birefringence, resist stack effects, tailored source polarizations, and blur effects of the mask and the resist. A generalized bilinear kernel is formed, which is independent of the mask transmission function, and which may then be treated using a decomposition to allow rapid computation of an image that includes such non-scalar effects. Weighted pre-images may be formed from a coherent sum of pre-computed convolutions of the dominant eigenfunctions of the generalized bilinear kernel with the appropriate mask polygon sectors. The image at a point may be formed from the incoherent sum of the weighted pre-images over all of the dominant eigenfunctions of the generalized bilinear kernel. The resulting image can then be used to perform model-based optical proximity correction (MBOPC).

REFERENCES:
patent: 6563566 (2003-05-01), Rosenbluth et al.
patent: 6738859 (2004-05-01), Liebchen
“Method Of Measuring The Spatial Resolution Of A Photoresist”—J.A. Hoffnagle, et al. 2002 Optical Society of America—p. 1776.
“Reduction Of ASIC Gate-Level Line-End Shortening By Mask Compensation”—J. Garofalo, et al. SPIE vol. 2440—Optical/Laser Microlithography VIII—p. 171.
“Improved Modeling Performance With An Adapted Vectorial Formulation Of The Hopkins Imaging Equation”—Adam, et al.—p. 78-91.
Simulation Of Imaging And Stray Light Effects In Immersion Lithography—Hafeman, et al. SPIE vol. 5040—Optical Microlithography XVI, ed. Anthony Yen (2003), p. 700.

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