Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate
2005-11-08
2008-12-30
Dinh, Paul (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Nanotechnology related integrated circuit design
C716S030000
Reexamination Certificate
active
07472372
ABSTRACT:
A fast method simulates photolithography using conventional image processing techniques. Convolution simulates blurring due to optics; erosion and dilation correct for edge diffraction. To produce the convolution kernel, an effective projection lens image for the image source is produced by convolving the lens image with an image of the illuminator aperture shape. An effective projection lens image for the stepper is produced similarly. The stepper effective lens image is divided by the image source effective lens image to produce a corrected effective lens image. A corrected convolution kernel is produced by taking a Fourier transform of the corrected effective lens image. The kernel is used to convolve the image, once using energy and once using voltage, and then squaring the result. The aerial image is produced by blending the energy and voltage convolutions according to the computed partial coherence of the optics. Complex convolution is used to represent relative phases other than 180 degrees.
REFERENCES:
patent: 6765651 (2004-07-01), Fiekowsky et al.
patent: 2005/0257187 (2005-11-01), Gallatin et al.
patent: 2006/0048090 (2006-03-01), Feldman
patent: 2006/0208205 (2006-09-01), Chen et al.
Fiekowsky Peter J.
Schuster Richard E.
Beyer Law Group LLP
Dinh Paul
Fiekowsky Peter J.
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