Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Patent
1997-02-13
1999-03-16
Pascal, Robert
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
31511181, 250251, H05H 302
Patent
active
058834702
ABSTRACT:
A fast atomic beam (FAB) source is capable of generating fast atomic beams having characteristics of a high beam density, precise directionality, and a wide range of controlled out put energy levels. The FAB source includes a discharge tube, an inductively coupled plasma generator for generating gas plasma in the discharge tube from gas introduced therein, positive and negative electrodes for accelerating ions to control the beam for a variety of energy levels. The negative electrode has a beam control opening for generating a FAB, wherein directionability, neutralization factor, and other FAB characteristics are controlled.
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Patent Abstracts of Japan, vol. 095, No. 001, 28 Feb. 1995 & JP 06 289198 A (Ebara Corporation), 18 Oct. 1994 * abstract *.
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Hatakeyama Masahiro
Ichiki Katsunori
Saitoh Masao
Toma Yasushi
Bettendorf Justin P.
Ebara Corporation
Pascal Robert
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