Fabrication process using a thin resist

Details Fabrication process using a thin resist Fabrication process using a thin resist

1996-05-24

1998-06-02

Duda, Kathleen

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430317, 15665911, 216 41, G03F 726

Patent

active

057597464

ABSTRACT:
A fabrication process includes a step of providing a substrate to be fabricated. A multi-layer antireflective layer is then formed on the substrate. A patterned resist having a thickness less than 850 nanometers is formed on the multi-layer antireflective layer and the substrate is fabricated using the patterned resist as a mask.

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