Fabrication process using a multi-layer antireflective layer

Details Fabrication process using a multi-layer antireflective layer Fabrication process using a multi-layer antireflective layer

1997-09-05

1999-12-07

Duda, Kathleen

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430950, G03F 700

Patent

active

059981008

ABSTRACT:
A fabrication process includes a step of providing a substrate to be fabricated. A multi-layer antireflective layer is then formed on the substrate. A patterned resist having a thickness less than 850 nanometers is formed on the multi-layer antireflective layer and the substrate is fabricated using the patterned resist as a mask.

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