Etching a substrate: processes – Etching of semiconductor material to produce an article...
Reexamination Certificate
2006-05-30
2006-05-30
Warden, Jill (Department: 1743)
Etching a substrate: processes
Etching of semiconductor material to produce an article...
Reexamination Certificate
active
07052616
ABSTRACT:
There is disclosed a method providing micro-scale devices, nano-scale devices, or devices having both nano-scale and micro-scale features. The method of the invention comprises fluidic assembly and various novel devices produced thereby. A variety of nanofluidic and molecular electronic type devices and structures having applications such as filtering and genetic sequencing are provided by the invention.
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Cuiffi Joseph
Fonash Stephen J.
Hayes Daniel J.
Nam Wook Jun
Borghetti Peter J.
Burns & Levinson LLP
Hyun Paul
Lopez Orlando
The Penn State Research Foundation
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