Fabrication of a microchannel plate from a perforated silicon

Details Fabrication of a microchannel plate from a perforated silicon Fabrication of a microchannel plate from a perforated silicon

1995-07-25

1996-08-13

Powell, William

Etching a substrate: processes

Etching of semiconductor material to produce an article...

216 56, 216 66, 1566431, 1566441, 1566571, 205655, B44C 122, C03C 1500, H01L 2100

Patent

active

055447724

ABSTRACT:
Manufacture of a microchannel plate may be improved using photoelectrochemical etching and thin film activation such as CVD and nitriding and oxidizing wall surface portions of pores formed in the substrate. The pore pattern may be changed by oxidizing and etching the substrate prior to activation.

REFERENCES:
patent: 5205902 (1993-04-01), Horton et al.

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