Semiconductor device manufacturing: process – Making device or circuit responsive to nonelectrical signal – Physical stress responsive
Reexamination Certificate
2005-11-08
2005-11-08
Mulpuri, Savitri (Department: 2812)
Semiconductor device manufacturing: process
Making device or circuit responsive to nonelectrical signal
Physical stress responsive
Reexamination Certificate
active
06962832
ABSTRACT:
A method for pseudo-planarization of an electromechanical device and for forming a durable metal contact on the electromechanical device and devices formed by the method are presented. The method comprises acts of depositing various layers forming a semiconductor device. Two principal aspects of the method include the formation of a planarized dielectric/conductor layer on a substrate and the formation of an electrode in an armature of a microelectromechanical switch, with the electrode formed such that it interlocks a structural layer of the armature to ensure it remains fixed to the armature over a large number of cycles.
REFERENCES:
patent: 5121089 (1992-06-01), Larson
patent: 5258591 (1993-11-01), Buck
patent: 5578976 (1996-11-01), Yao
patent: 5629565 (1997-05-01), Schlaak et al.
patent: 5638946 (1997-06-01), Zavracky
patent: 6046659 (2000-04-01), Loo et al.
patent: 6331257 (2001-12-01), Loo et al.
patent: 6402969 (2002-06-01), Rodgers et al.
patent: 6440767 (2002-08-01), Loo et al.
patent: 6667245 (2003-12-01), Chow et al.
patent: 6803559 (2004-10-01), Hsu et al.
patent: 6842097 (2005-01-01), Hsu et al.
Petersen, K.E. 1978, “Dynamic micromechanics on silison: techniques and devices”.
Petersen, K.E, “Forming the Contact Surface of Micromechanical Switches”, IBM J. Res. Develop., vol. 23, No. 4, Jul. 1979, pp. 376-385.
Daniel Hyman, Juan Lam, Brett Warneke, Adele Schmitz, T.Y. Hsu, Julia Brown, James Schaffner, Andy Walston, Robert Y. Loo, Mehran Mehregany, and Jae Lee, “Surface-micromachined RF MEMS switches on GaAs substrates, ” International Journal of RF and Microwave CAE, vol. 9, No. 4, Jul. 1999, pp. 348-361.
Y. Wang, Z. Li. D. T. McCormick, and N. C. Tien, “A Low-voltage Lateral MEMS Switch with High RF performance, ” Journal of MicroElectroMechanical Systems (JMEMS), vol. 13, No. 6, Dec. 2004, pp. 902-911.
Yao, J.J., “RF MEMS from a device perspective”, Journal Micromechanics and Microengineering 10: R9-R38, 2000.
Zavracky , P.M., Majumdar, S., McGruer,N, 1997, “Micromechanical switches fabricated using nickel surface micromachining”, Journal of Mircoelectromechannical Systems 6(1): 3-9.
Mulpuri Savitri
Wireless MEMS, Inc.
LandOfFree
Fabrication method for making a planar cantilever, low... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Fabrication method for making a planar cantilever, low..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Fabrication method for making a planar cantilever, low... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3482949