Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Patent
1998-11-18
2000-01-18
Berman, Jack I.
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
25049222, H01J 37302
Patent
active
060159766
ABSTRACT:
Three-dimensional ultra-fine micro-fabricated structures of the order of .mu.m and less are produced for use in advanced optical communication systems and quantum effect devices. Basic components are an energy beam source, a mask member and a specimen stage. The mask member is an independent component, and various combinations of relative movements of the mask member with respect to the beam axis and/or workpiece can be made with high precision to produce curved or slanted surfaces on a workpiece, thereby producing multiple lines or arrays of convex or concave micro-lenses. Other examples of fine-structures include deposition of thin films in a multiple line pattern or in an array pattern. Because of flexibility of fabrication and material, labyrinth seals having curved surfaces with grooved structures can be used as friction reduction devices for bearing components. Fine groove dimensions of the order of nm are possible. Energy beams can be any of fast atomic beams, ion beams, electron beam, laser beams, radiation beams, X-ray beams and radical particle beams. Parallel beams are often used, but when a focused bean is used, a technique of reduced projection imaging can be utilized to produce fine-structures of the order of nm.
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Hatakeyama Masahiro
Hatamura Yotaro
Ichiki Katsunori
Kato Takao
Nakao Masayuki
Berman Jack I.
Ebara Corporation
Hatamura Yotaro
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