Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Reexamination Certificate
2004-04-02
2008-08-05
Huff, Mark F. (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
C430S324000, C430S330000, C430S296000, C430S320000, C430S314000
Reexamination Certificate
active
07407738
ABSTRACT:
This disclosure relates to a system and method for fabricating and using a superlattice. A superlattice can be fabricated by applying alternating material layers on a ridge and then removing some of the alternating layers to expose edges. These exposed edges can be of nearly arbitrary length and curvature. These edges can be used to fabricate an array of nano-scale-width curved wires.
REFERENCES:
patent: 2744970 (1956-05-01), Shockley
patent: 2939057 (1960-05-01), Tezner
patent: 3964296 (1976-06-01), Matzuk
patent: 4701366 (1987-10-01), Deckman
patent: 5008616 (1991-04-01), Lauks et al.
patent: 5118801 (1992-06-01), Lizardi et al.
patent: 5132278 (1992-07-01), Stevens et al.
patent: 5202290 (1993-04-01), Moskovits
patent: 5237523 (1993-08-01), Bonne et al.
patent: 5330612 (1994-07-01), Watanabe
patent: 5376755 (1994-12-01), Negm et al.
patent: 5418558 (1995-05-01), Hock et al.
patent: 5493167 (1996-02-01), Mikol et al.
patent: 5591896 (1997-01-01), Lin
patent: 5622825 (1997-04-01), Law et al.
patent: 5747180 (1998-05-01), Miller et al.
patent: 5767521 (1998-06-01), Takeno et al.
patent: 5772905 (1998-06-01), Chou
patent: 5780710 (1998-07-01), Murase et al.
patent: 5801124 (1998-09-01), Gambl et al.
patent: 5837454 (1998-11-01), Cozzette et al.
patent: 5837466 (1998-11-01), Lane et al.
patent: 5843653 (1998-12-01), Gold et al.
patent: 5869244 (1999-02-01), Martin et al.
patent: 5918110 (1999-06-01), Abraham-Fuchs et al.
patent: 5972710 (1999-10-01), Weigl et al.
patent: 5997958 (1999-12-01), Sato et al.
patent: 6022669 (2000-02-01), Uchida et al.
patent: 6022749 (2000-02-01), Davis et al.
patent: 6034389 (2000-03-01), Burns, Jr. et al.
patent: 6085413 (2000-07-01), Klassen et al.
patent: 6120844 (2000-09-01), Chen et al.
patent: 6150097 (2000-11-01), Tyagi et al.
patent: 6150106 (2000-11-01), Martin et al.
patent: 6231744 (2001-05-01), Ying et al.
patent: 6238085 (2001-05-01), Higashi et al.
patent: 6256767 (2001-07-01), Kuekes et al.
patent: 6265306 (2001-07-01), Starnes et al.
patent: 6284979 (2001-09-01), Malozemoff et al.
patent: 6294450 (2001-09-01), Chen et al.
patent: 6331680 (2001-12-01), Klassen et al.
patent: 6355436 (2002-03-01), Martin et al.
patent: 6359288 (2002-03-01), Ying et al.
patent: 6360582 (2002-03-01), Chelvayohan et al.
patent: 6365059 (2002-04-01), Pechenik
patent: 6407443 (2002-06-01), Chen et al.
patent: 6438501 (2002-08-01), Szecsody et al.
patent: 6463124 (2002-10-01), Weisman
patent: 6482639 (2002-11-01), Snow et al.
patent: 6521109 (2003-02-01), Bartic et al.
patent: 6562577 (2003-05-01), Martin et al.
patent: 6643491 (2003-11-01), Kinouchi et al.
patent: 6656275 (2003-12-01), Iwamoto
patent: 6664031 (2003-12-01), Jung et al.
patent: 6680377 (2004-01-01), Stanton et al.
patent: 6694800 (2004-02-01), Weckstrom et al.
patent: 6747180 (2004-06-01), Ostgard et al.
patent: 2001/0046674 (2001-11-01), Ellington
patent: 2002/0012937 (2002-01-01), Tender et al.
patent: 2002/0061536 (2002-05-01), Martin et al.
patent: 2002/0117659 (2002-08-01), Lieber et al.
patent: 2002/0130353 (2002-09-01), Lieber et al.
patent: 2002/0175408 (2002-11-01), Majumdar et al.
patent: 2003/0089899 (2003-05-01), Lieber et al.
patent: 2003/0121791 (2003-07-01), Cohen
patent: 2003/0132461 (2003-07-01), Roesner et al.
patent: 2003/0148562 (2003-08-01), Luyken et al.
patent: 2003/0162190 (2003-08-01), Gorenstein et al.
patent: 2003/0170650 (2003-09-01), Karube et al.
patent: 2003/0183008 (2003-10-01), Bang et al.
patent: 2003/0186522 (2003-10-01), Duan et al.
patent: 2003/0189202 (2003-10-01), Li et al.
patent: 2003/0219801 (2003-11-01), Lipshutz
patent: 2003/0224435 (2003-12-01), Seiwert
patent: 2004/0005723 (2004-01-01), Empedocles et al.
patent: 2004/0005923 (2004-01-01), Allard et al.
patent: 2004/0007740 (2004-01-01), Abstreiter et al.
patent: 2004/0009510 (2004-01-01), Selwert et al.
patent: 2004/0028936 (2004-02-01), Kogiso et al.
patent: 2004/0031975 (2004-02-01), Kern et al.
patent: 2004/0043527 (2004-03-01), Bradley et al.
patent: 2004/0061234 (2004-04-01), Shah et al.
patent: 2004/0134772 (2004-07-01), Cohen et al.
patent: 2006/0003267 (2006-01-01), Ramamoorthi et al.
patent: 2007/0020773 (2007-01-01), Kornilovich et al.
patent: 2007/0069194 (2007-03-01), Kornilovich et al.
patent: 1 547 970 (2005-06-01), None
patent: WO 2005/038093 (2005-04-01), None
U.S. Appl. No. 11/460,598.
Melosh et al., “Ultrahigh-Density Nanowire Lattices and Circuits,” California Nanosystems Institute, University of California, Scienceexpress Report, Scienceexpress/www.scienceexpress.org/13 March 2003/10.1126/science.1081940, pp. 1-4.
Covington, et al., “A polymer gate FET sensor array for detecting organic vapours,” Sensors and Actuators B 77 Elsevier Science 2001, pp. 155-162.
Melosh, et al.; Ultrahigh-Density Nanowire Lattices and Circuits, California Nanosystems Institute, University of California, Sciencexpress Report, Sciencexpress/www.sciencexpress.org/13March2003/10.1126/science.1081940, pp. 1-4.
Coleman, et al; Percolation-dominated conductivity in a conjugated-polymer-carbon-nanotube composite,: Rapid Communications, Physical Review B, vol. 58, No. 12, Sep. 15, 1998, coyright The American Physical Society, 4 pages.
Choi, et al; “Sublighographic nanofabrication technology for nanocatalysts and DNA Chips”; J. Vac. Sci. Technol. B 21(6), Nov./Dec. 2003; pp. 2951-2955.
Kornilovich Pavel
Mardilovich Peter
Stasiak James
Thirukkovalur Niranjan
Huff Mark F.
Sullivan Caleen O
LandOfFree
Fabrication and use of superlattice does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Fabrication and use of superlattice, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Fabrication and use of superlattice will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4009422