Fabricating sub-resolution structures in planar lightwave...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface

Reexamination Certificate

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C430S321000, C430S323000, C430S324000, C430S329000, C385S131000, C385S014000, C438S696000, C438S695000, C438S700000, C359S569000

Reexamination Certificate

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06913871

ABSTRACT:
Optical gratings are fabricated on a scale that may be smaller than the resolution of the lithographic system used to generate the grating pattern. Parallel ridges are formed using lithographic techniques. A conformal deposition and anisotropic etch are then used to form sidewalls on the sides of the ridges. After removing the ridges, the remaining sidewalls are used as a mask to etch the substrate. Removing the sidewalls leaves the desired grating pattern, with a pitch spacing of one-half that of the original ridges.

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patent: 6337871 (2002-01-01), Choa
Otte Jakob Homan, A GaAs/AIGaAs DBR laser diode with side-coupled Bragg gratings, A Dissertation submitted to the Swiss Federal Institute of Technology, Zurich for the degree of Doctor of Technical Services, 1996, pp. 67-80.

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