Extreme ultraviolet illumination source

Details Extreme ultraviolet illumination source Extreme ultraviolet illumination source

2006-09-19

2006-09-19

Lee, John R. (Department: 2881)

Radiant energy

Radiant energy generation and sources

With radiation modifying member

C250S251000, C378S119000, C378S121000, C315S111810, C315S111910, C204S158200

Reexamination Certificate

active

07109504

ABSTRACT:
According to a first embodiment of the invention, a dual cathode electrode for generating EUV light is disclosed. The dual cathode electrode may include a first outer cathode, a second inner cathode, and an anode disposed between the inner and outer cathodes. The dual cathode electrode also includes a plasma disposed in between the cathodes that emits EUV photons when it is excited by an arc between the anode and the cathodes. According to a second embodiment of the invention, several Dense Plasma Focus (DPF) electrodes are placed along a circle. The DPF electrodes, when activated, will emit electron photons from the circle in which they are placed thereby avoiding obscuration used to protect UV mirrors against debris.

REFERENCES:
patent: 6590959 (2003-07-01), Kandaka et al.
patent: 6804327 (2004-10-01), Schriever et al.
patent: 2004/0071267 (2004-04-01), Jacob et al.
Hutcheson, G., “The First Nanochps,”Scientific American, Apr. 2004, pp. 76-83.
Stix, G., “Getting More from Moore's,” Scientific American.com, Apr. 17, 2001, 6 pgs.

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