Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With radio frequency antenna or inductive coil gas...
Reexamination Certificate
2006-08-22
2006-08-22
McDonald, Rodney G. (Department: 1753)
Adhesive bonding and miscellaneous chemical manufacture
Differential fluid etching apparatus
With radio frequency antenna or inductive coil gas...
C156S345330, C156S345340, C156S345350, C118S7230IR, C118S7230IR, C118S7230MP, C204S298060
Reexamination Certificate
active
07094316
ABSTRACT:
A plasma reactor for processing a workpiece, including an enclosure defining a vacuum chamber, a workpiece support within the enclosure facing an overlying portion of the enclosure, the enclosure having at least first and second openings therethrough near generally opposite sides of the workpiece support. At least one hollow conduit is connected to the first and second openings. A closed torroidal path is provided through the conduit and extending between the first and second openings across the wafer surface. A process gas supply is coupled to the interior of the chamber for supplying process gas to the torroidal path. A coil antenna is coupled to an RF power source and inductively, coupled to the interior of the hollow conduit and capable of maintaining a plasma in the torroidal path.
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Collins Kenneth S
Hanawa Hiroji
Nguyen Andrew
Ramaswamy Kartik
Tanaka Tsutomu
Applied Materials Inc.
McDonald Rodney G.
Wallace Robert M.
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