Exposure system, test mask for monitoring polarization, and...

Details Exposure system, test mask for monitoring polarization, and... Exposure system, test mask for monitoring polarization, and...

2005-11-07

2008-10-21

Chowdhury, Tarifur R (Department: 2886)

Optics: measuring and testing

By polarized light examination

Of surface reflection

C356S364000

Reexamination Certificate

active

07440104

ABSTRACT:
An exposure system includes an exposure tool configured to project grating patterns oriented in different directions onto test areas by a linearly polarized light, respectively, each of the grating patterns having a space width preventing higher order diffracted lights from an image formation, a data collector configured to collect sets of test optical intensity data on the test areas, and a polarization direction monitor configured to monitor a polarization direction of the linearly polarized light by comparing the sets of the test optical intensity data.

REFERENCES:
patent: 5636004 (1997-06-01), Ootaka et al.
patent: 2004/0137338 (2004-07-01), Inao et al.
patent: 11-087232 (1999-03-01), None
patent: 11-233434 (1999-08-01), None
patent: 2000-310850 (2000-11-01), None

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