Exposure process and system

Details Exposure process and system Exposure process and system

1982-06-10

1984-10-02

Church, Craig E.

X-ray or gamma ray systems or devices

Specific application

Lithography

2504922, G21K 500

Patent

active

044752237

ABSTRACT:
An X ray exposure process and system for transferring a mask pattern onto a wafer with use of X rays, wherein heights on the mask at many points are measured on a light interference band basis by a mask-height measuring device of non-contact measurement type at an X ray exposure position, the mask being mounted on a chamber which is filled with a He gas and or the like to prevent attenuation of an X ray source, heights on the wafer at many points are measured at a wafer-height measuring position different from said exposure position, and according to the measured results, the wafer is finely moved upwardly or downwardly (that is, deformed) individually independently by means of a chuck which sucks and holds the wafer at many points thereon so that, a gap between the mask and wafer is adjusted to a desired level.

REFERENCES:
patent: 4122335 (1978-10-01), Sullivan

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