Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Electron beam imaging
Patent
1979-02-16
1981-05-12
Newsome, John H.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Electron beam imaging
430270, 430312, 430967, B05D 306, G03F 726
Patent
active
042672597
ABSTRACT:
Radiation sensitive layers are x-ray exposed by providing a metal mask pattern on the layer through which the layer is exposed. The metal mask pattern is formed by applying a blanket metal layer to the radiation sensitive layer followed by an electron beam sensitive resist layer which is patterned by an electron beam exposure process. The exposed portions of the metal layer are then etched away to form the metal mask pattern.
REFERENCES:
patent: 3849136 (1974-11-01), Grebe
patent: 4165395 (1979-08-01), Chang
Gunther-Mohr, "IBM Tech. Disc. Bull." vol. 21, No. 8, pp. 3176, 3177, Jan. 1979.
Bohlen Harald
Greschner Johann
Kulcke Werner
Nehmiz Peter
International Business Machines - Corporation
McBride James R.
Newsome John H.
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