Exposure control in an X-ray exposure apparatus

Details Exposure control in an X-ray exposure apparatus Exposure control in an X-ray exposure apparatus

1994-01-18

1994-11-15

Church, Craig E.

X-ray or gamma ray systems or devices

Specific application

Lithography

378160, G21K 500

Patent

active

053655613

ABSTRACT:
Exposure control method and apparatus particularly suitably usable in an X-ray exposure apparatus, for exposing a mask and a wafer to radiation (X-rays) from a synchrotron to transfer a pattern formed on a mask onto the wafer, is disclosed. A shutter device for controlling passage and interception of the synchrotron radiation is provided between the synchrotron and the wafer. The shutter device includes a blade member having a leading edge and a trailing edge which are rectilinearly movable in a direction in which there exists non-uniformness in illuminance of the radiation. The leading edge is used to determine the timing of start of passage of the radiation to the wafer, while the trailing edge is used to determine the timing of interception of the radiation. The moving speeds of the leading edge and the trailing edge are controlled independently of each other to provide different exposure times for different portions of an exposure region on the wafer, in accordance with the non-uniformness in illuminance. By this, the amount of absorption of radiation by a resist material on the wafer can be make uniform throughout the exposure region.

REFERENCES:
patent: 3069549 (1962-12-01), Thompson
patent: 3934151 (1976-01-01), Stowe
patent: 3980407 (1976-09-01), Hill
patent: 4203037 (1980-05-01), Gur et al.
patent: 4514857 (1985-04-01), Kimura et al.
Michel, Die Wissenschaftliche und Angewandte Photographie [Scientific and Applied Photography], pp. 171-181.

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