Exposure apparatus and method for producing device

Details Exposure apparatus and method for producing device Exposure apparatus and method for producing device

2011-08-23

2011-08-23

Nguyen, Hung Henry (Department: 2882)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S030000

Reexamination Certificate

active

08004653

ABSTRACT:
A liquid immersion exposure apparatus includes an optical element via which a patterned beam is projected onto a substrate in an exposure operation, a liquid supply system having a supply port from which exposure liquid is supplied, and a member which has a surface and which is different from the substrate. In the exposure operation, the liquid supply system supplies the exposure liquid from the supply port to a space between the optical element and the substrate. In a cleaning operation, the member is moved to a position at which the surface of the member faces the optical element, and the liquid supply system supplies the exposure liquid from the supply port to a space between the optical element and the surface of the member.

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