Exposure apparatus and method for forming fine patterns of...

Details Exposure apparatus and method for forming fine patterns of... Exposure apparatus and method for forming fine patterns of...

2008-01-15

2008-01-15

Huff, Mark F. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

C430S397000

Reexamination Certificate

active

07318997

ABSTRACT:
Disclosed are an exposure apparatus for forming fine patterns of a semiconductor using an electric field and a method for forming fine patterns using the exposure apparatus. The exposure apparatus comprises an electric field generator for generating an electric field to be applied to infiltrate an acid (H+) produced when a photoresist film is exposed into non-exposure regions. Non-exposure regions into which an acid is infiltrated along with exposure regions in a development process can be removed by applying an electric field to the acid produced during exposure of a photoresist film such that the acid is infiltrated into the non-exposure regions.

REFERENCES:
patent: 5258266 (1993-11-01), Tokui et al.
patent: 6245491 (2001-06-01), Shi
patent: 6686132 (2004-02-01), Cheng et al.
patent: 2002/0046703 (2002-04-01), Templeton

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