Optics: measuring and testing – By alignment in lateral direction – With light detector
Patent
1990-08-07
1993-01-26
Evans, F. L.
Optics: measuring and testing
By alignment in lateral direction
With light detector
356401, 250548, G01B 1100
Patent
active
051826151
ABSTRACT:
An exposure apparatus for printing a pattern of a mask to a wafer includes a mask moving mechanism for moving the mask; a wafer moving mechanism or moving the wafer along a predetermined movement coordinate; a measuring system for measuring an error with respect to the movement coordinate, resulting from the movement of the mask by the mask moving mechanism; and a memorizing device for memorizing a data table prepared on the basis of the error measured by the measuring system; wherein the wafer moving mechanism uses the data in the data table when it moves the wafer for positioning of the wafer with respect to the mask.
REFERENCES:
patent: 4553834 (1985-11-01), Ayata et al.
patent: 4629313 (1986-12-01), Tanimoto
patent: 4676630 (1987-06-01), Matsushita et al.
patent: 4704033 (1987-11-01), Fay et al.
patent: 4748477 (1988-05-01), Isohata et al.
patent: 4998134 (1991-03-01), Isohata et al.
Kariya Takao
Kurosawa Hiroshi
Mizusawa Nobutoshi
Nose Noriyuki
Ozawa Kunitaka
Canon Kabushiki Kaisha
Evans F. L.
Hantis K. P.
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