4. Optics: measuring and testing
  5. By dispersed light spectroscopy
  6. Utilizing a spectrometer

Yoriyuki Ishibashi

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Exposure apparatus

X-ray or gamma ray systems or devices – Specific application – Lithography
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Focusing apparatus and optical disk apparatus using the same

Dynamic information storage or retrieval – With servo positioning of transducer assembly over track... – Optical servo system
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Method and an apparatus for measuring a displacement between two

Optics: measuring and testing – By dispersed light spectroscopy – Utilizing a spectrometer
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Method and apparatus for aligning two objects, and method and ap

Optics: measuring and testing – By particle light scattering – With photocell detection
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Method and apparatus for aligning two objects, and method and ap

Optics: measuring and testing – By particle light scattering – With photocell detection
Patent

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Profile ID: LFUS-PAI-P-320506

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