Exhaust processing method, plasma processing method and...

Hazardous or toxic waste destruction or containment – Processes for making harmful chemical substances harmless,... – By heating to effect chemical change. e.g. – pyrolysis

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C427S569000, C427S562000, C134S001000, C216S067000, C118S7230AN, C118S7230ER, C118S7230IR

Reexamination Certificate

active

09822191

ABSTRACT:
A chemical-reaction inducing means is provided in an exhaust line connecting a processing space for subjecting a substrate or a film to plasma processing to an exhaust means, and at least either an unreacted gas or byproduct exhausted from the processing space are caused to chemically react without allowing plasma in the processing space to reach the chemical-reaction inducing means, thereby improving the processing ability of the chemical-reaction inducing means to process the unreacted gas or byproduct.

REFERENCES:
patent: 4735633 (1988-04-01), Chiu
patent: 5126169 (1992-06-01), Ishihara et al.
patent: 5130170 (1992-07-01), Kanai et al.
patent: 5137701 (1992-08-01), Mundt
patent: 5370739 (1994-12-01), Foster et al.
patent: 5468521 (1995-11-01), Kanai et al.
patent: 5482557 (1996-01-01), Kanai et al.
patent: 5569810 (1996-10-01), Tsuji
patent: 5575855 (1996-11-01), Kanai et al.
patent: 5897332 (1999-04-01), Hori et al.
patent: 5900103 (1999-05-01), Tomoyasu et al.
patent: 5976257 (1999-11-01), Kanai et al.
patent: 6031198 (2000-02-01), Moriyama et al.
patent: 6106625 (2000-08-01), Koai et al.
patent: 6153013 (2000-11-01), Sakai et al.
patent: 6159300 (2000-12-01), Hori et al.
patent: 6189482 (2001-02-01), Zhao et al.
patent: 6194628 (2001-02-01), Pang et al.
patent: 6223684 (2001-05-01), Fujioka et al.
patent: 6361706 (2002-03-01), Gabriel
patent: 6403491 (2002-06-01), Liu et al.
patent: 7009281 (2006-03-01), Bailey et al.
patent: 7022293 (2006-04-01), Hogan
patent: 7022298 (2006-04-01), Hasegawa
patent: 7044997 (2006-05-01), Mardian et al.
patent: 7109660 (2006-09-01), Ishihara et al.
patent: 2005/0003675 (2005-01-01), Carducci et al.
patent: 2006/0051254 (2006-03-01), Seol
patent: 2006/0101993 (2006-05-01), Mardian et al.
patent: 2006/0105575 (2006-05-01), Bailey et al.
patent: 4-136175 (1992-05-01), None
patent: 8-218174 (1996-08-01), None
patent: 08-299784 (1996-11-01), None
patent: 2006-224066 (2006-08-01), None
patent: 2006-297275 (2006-11-01), None
Machine translation—JP08-218,174 to Chiba Hideshige et al & Patent Abstract of Japan, Aug. 1996.
Machine translation —JP07-130,674 to Miyagi Katsuncbu et al & Patent Abstract, May 1995.
Patent Abstract of Japan for JP04-136,175 to Tanimura Shoichi, May 1992.
Translation of JP 04-136175 A to Shoichi Tanimura, pub. May 1992.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Exhaust processing method, plasma processing method and... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Exhaust processing method, plasma processing method and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exhaust processing method, plasma processing method and... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3737531

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.