EUV reflective mask having a carbon film and a method of...

Details EUV reflective mask having a carbon film and a method of... EUV reflective mask having a carbon film and a method of...

2005-03-22

2005-03-22

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

06869734

ABSTRACT:
An exemplary embodiment relates to a mask for integrated circuit fabrication equipment. The mask includes a multilayer film and an amorphous carbon layer above the multilayer film. The multilayer film is at least partially relatively reflective to radiation having a wavelength of less than 70 nanometers.

REFERENCES:
patent: 6573030 (2003-06-01), Fairbairn et al.
patent: 6653735 (2003-11-01), Yang et al.

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