Etch inhibitors in developer for lithographic printing plates

Details Etch inhibitors in developer for lithographic printing plates Etch inhibitors in developer for lithographic printing plates

1997-10-06

1999-12-07

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430331, G03F 730, G03F 732

Patent

active

059981024

ABSTRACT:
A developer composition for photosensitive elements including lithographic printing plates, color proofing films, positive and negative working lithographic plates and thermally sensitive plates giving high image contrast and reduced oxide attack to image surfaces said composition comprises: a source of hydroxyl ions sufficient to provide said developer composition to have a pH of from about 10 to about 14; an optional buffer; an etch inhibiting additive, and sufficient water to produce a developer composition. A method for forming an image also is disclosed.

REFERENCES:
patent: 4259434 (1981-03-01), Yamasue et al.
patent: 5466559 (1995-11-01), Miller et al.
patent: 5480762 (1996-01-01), Toyama et al.

Affiliated with

Also associated with

Rating

Etch inhibitors in developer for lithographic printing plates does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Etch inhibitors in developer for lithographic printing plates, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Etch inhibitors in developer for lithographic printing plates will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-822136