ESD protection structure

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S173000, C257S174000, C257S356000, C257S357000, C257S358000, C257S359000, C257S360000, C257S361000, C257S362000, C257S363000, C257SE27001, C257SE29001

Reexamination Certificate

active

07638847

ABSTRACT:
An ESD protection structure includes, in part, a NMOS transistor having a source and drain in a well in a substrate and a gate on the substrate with the source and drain being connected between ground and a series diode, and the gate being connected to ground. The structure further includes a diode having a cathode connected to the input pad and an anode connected to the well so that the diode is reverse-biased in the event of a positive voltage ESD event on the input pad. As a result, in a positive voltage ESD event, the avalanche effect rapidly injects current into the substrate and therefore into the base of the parasitic bipolar transistor so as to trigger the transistor into conduction and discharge the ESD pulse. Alternatively, the diode is a Zener diode and the current is generated by the Zener effect. A complementary structure provides protection against a negative ESD pulse.

REFERENCES:
patent: 5032742 (1991-07-01), Zanders
patent: 5416351 (1995-05-01), Ito et al.
patent: 5541801 (1996-07-01), Lee et al.
patent: 5576557 (1996-11-01), Ker et al.
patent: 6191454 (2001-02-01), Hirata et al.
patent: 6465768 (2002-10-01), Ker et al.
patent: 6548868 (2003-04-01), Tsuei et al.
patent: 6611028 (2003-08-01), Cheng et al.
patent: 6898062 (2005-05-01), Russ et al.
patent: 2001/0016380 (2001-08-01), Watanabe et al.
patent: 2002/0130366 (2002-09-01), Morishita
patent: 2003/0067040 (2003-04-01), Chen et al.
patent: 2003/0090845 (2003-05-01), Ker et al.
patent: 2003/0137789 (2003-07-01), Walker et al.
patent: 2003/0213995 (2003-11-01), Duvvury et al.
patent: 2004/0212936 (2004-10-01), Salling et al.
patent: 2006/0223258 (2006-10-01), Okushima
patent: 2007/0108527 (2007-05-01), Lee et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

ESD protection structure does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with ESD protection structure, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and ESD protection structure will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4099930

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.