Semiconductor device manufacturing: process – Including control responsive to sensed condition – Electrical characteristic sensed
Reexamination Certificate
2008-06-10
2008-06-10
Estrada, Michelle (Department: 2823)
Semiconductor device manufacturing: process
Including control responsive to sensed condition
Electrical characteristic sensed
C438S199000, C438S275000, C438S335000, C438S357000, C257SE21350, C257SE21605
Reexamination Certificate
active
07384802
ABSTRACT:
An electrostatic discharge (ESD) protection structure and a method for forming the same are provided. The structure includes a substrate having a buried layer, and a first and a second high-voltage well region on the buried layer. The first and second high-voltage well regions have opposite conductivity types and physically contact each other. The structure further includes a field region extending from the first high-voltage well region into the second high-voltage well region, a first doped region in the first high-voltage well region and physically contacting the field region, and a second doped region in the second high-voltage well region and physically contacting the field region. The first and second doped regions and the first high-voltage well region form a bipolar transistor that can protect an integrated circuit from ESD.
REFERENCES:
patent: 5872379 (1999-02-01), Lee
patent: 6066879 (2000-05-01), Lee et al.
patent: 6268992 (2001-07-01), Lee et al.
patent: 6274443 (2001-08-01), Yu et al.
patent: 6333234 (2001-12-01), Liu
patent: 6344385 (2002-02-01), Jun et al.
patent: 6459127 (2002-10-01), Lee et al.
patent: 6498373 (2002-12-01), Vashchenko et al.
patent: 6552399 (2003-04-01), Jun et al.
patent: 6734054 (2004-05-01), Tang et al.
patent: 6833592 (2004-12-01), Lee
patent: 6869840 (2005-03-01), Chatterjee et al.
patent: 6927459 (2005-08-01), Hokazono et al.
patent: 7223647 (2007-05-01), Hsu et al.
Lin, K.-H., et al., “Design on Latchup-Free Power-Rail ESD Clamp Circuit in High-Voltage CMOS ICs,” EOS/ESD Symposium 2004, pp. 265-261.
Jong Yu-Chang
Lee Jian-Hsing
Estrada Michelle
Slater & Matsil L.L.P.
Taiwan Semiconductor Manufacturing Company , Ltd.
LandOfFree
ESD protection device for high voltage does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with ESD protection device for high voltage, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and ESD protection device for high voltage will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2812873