Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Patent
1993-11-05
1995-02-28
Sikes, William L.
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
257315, 257317, H01L 29788
Patent
active
053940024
ABSTRACT:
According to the invention, an electrically-erasable, electrically programmable read-only memory cell is formed at the face of a semiconductor layer 321 of a first conductivity type. A source region 311 and a drain region 312 are formed at the face of semiconductor layer 321 to be of a second conductivity type opposite the first conductivity type. Source region 311 and drain region 312 are spaced by a channel 313. A tunneling oxide window 327 is formed adjacent source region 311. A floating gate 314 is formed insulatively adjacent the entire length of channel 313 between source region 311 and drain region 312. Floating gate 314 is also formed directly adjacent tunneling oxide window 327. A control gate 315 is disposed 15 insulatively adjacent floating gate 314.
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Dang Hung Xuan
Donaldson Richard L.
Kesterson James C.
Matsil Ira S.
Sikes William L.
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