Equipment for UV wafer heating and photochemistry

Details Equipment for UV wafer heating and photochemistry Equipment for UV wafer heating and photochemistry

1997-10-21

2000-12-26

Lund, Jeffrie R

Coating apparatus

Gas or vapor deposition

With treating means

118715, 118724, 118725, 156345, 2504921, 2504922, C23C 1600

Patent

active

061652733

ABSTRACT:
The apparatus of the present invention provides for the dual use of a UV source to heat a substrate and to facilitate photochemistry necessary for the treatment of the substrate.
The present invention also provides a method for processing a substrate by heating the substrate to a temperature above ambient via UV radiation at a first power level and conditioning the substrate by exposing the substrate to a photochemically (UV) reactive chemical, or a reactive chemical that can react with a compound on the surface of the substrate to form a photochemically reactive compound, in the presence of UV radiation at a second power level.

REFERENCES:
patent: 4028135 (1977-06-01), Vig et al.
patent: 4167669 (1979-09-01), Panico
patent: 4443533 (1984-04-01), Panico
patent: 4522674 (1985-06-01), Ninomiya et al.
patent: 4540466 (1985-09-01), Nishizawa
patent: 4568632 (1986-02-01), Blum et al.
patent: 4643799 (1987-02-01), Tsujii et al.
patent: 4678536 (1987-07-01), Murayama et al.
patent: 4687544 (1987-08-01), Bersin
patent: 4705593 (1987-11-01), Haigh et al.
patent: 4711790 (1987-12-01), Moirshige
patent: 4741800 (1988-05-01), Yamazuki
patent: 4756047 (1988-07-01), Hayashi et al.
patent: 4857382 (1989-08-01), Liu et al.
patent: 4871416 (1989-10-01), Fukuda
patent: 4986216 (1991-01-01), Ohmori et al.
patent: 5119760 (1992-06-01), McMillan et al.
patent: 5228206 (1993-07-01), Grant et al.
patent: 5288684 (1994-02-01), Yamazaki et al.
patent: 5332442 (1994-07-01), Kubodera et al.
patent: 5439553 (1995-08-01), Grant et al.
patent: 5470799 (1995-11-01), Itoh et al.
patent: 5580421 (1996-12-01), Hiatt et al.
patent: 5789755 (1998-08-01), Bender
patent: 5814156 (1998-09-01), Elliott et al.
patent: 6015759 (2000-01-01), Khan et al.
T. Aoyama et al., Surface Cleaning for Si Epitaxy Using Photoexcited Fluorine Gas, J. Electrochem. Soc., vol. 140, No. 2, pp. 366-371, Feb. 1993.
Derwent patent abstract, JP 61-053731 (Mar. 1986).
Derwent patent abstract, JP 61-51585 (May 1994).
Ruzyllo, section 7-3 of Semiconductor Wafer Cleaning Technology, (Feb. 1993).
Patent abstract of Japan, abstract of JP 63-297563 (May 1988).
Derwent patent abstract, JP 62-166529, (Jul. 1987).
JAPIO patent abstract, JP 01-104682 (Apr. 1989).
IFI/Plenum patent abstract, US 5451425 (Sep. 1995).
IFI/Plenum patent abstract, US 4798960 (Jan. 1989).
Derwent patent abstract, KR 9405754 (Jun. 1994).
Derwent patent abstract, KR 9301193 (Feb. 1993).
Derwent patent abstract, JP 5070295 (Mar. 1993).
Derwent patent abstract, JP 62-174925 (Jul. 1987).
Derwent patent abstract, JP 62086731 (Apr. 1987).
Derwent patent abstract, JP 52144021 (Dec. 1977).
JAPIO patent abstract, JP 06-157190 (Jun. 1994).
JAPIO patent abstract, JP 01-235232 (Sep. 1989).

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