Enhancement of resist development

Details Enhancement of resist development Enhancement of resist development

1979-05-07

1982-11-16

Louie, Jr., Won H.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430296, G03C 500

Patent

active

043595200

ABSTRACT:
The present invention is concerned with enhancement of resist development. In particular it is concerned with obtaining high solubility rate ratio between the exposed and the unexposed regions of a resist and also obtaining shorter development time. These objectives are achieved by treating the resist with a liquid trialkylamine having from two to eight carbon atoms in each alkyl group.

REFERENCES:
patent: 3046119 (1962-07-01), Sus
patent: 3902906 (1975-09-01), Iwama et al.
patent: 3950173 (1976-04-01), Ross et al.
patent: 3961100 (1976-06-01), Harris et al.
patent: 3961101 (1976-06-01), Barton
patent: 4007047 (1977-02-01), Kaplan et al.

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