Cleaning and liquid contact with solids – Apparatus – Automatic controls
Reexamination Certificate
2007-12-11
2009-08-04
Perrin, Joseph L (Department: 1792)
Cleaning and liquid contact with solids
Apparatus
Automatic controls
C134S095200, C134S099100, C134S902000
Reexamination Certificate
active
07568488
ABSTRACT:
A method for removing post-processing residues in a single wafer cleaning system is provided. The method initiates with providing a first heated fluid to a proximity head disposed over a substrate. Then, a meniscus of the first fluid is generated between a surface of the substrate and an opposing surface of the proximity head. The substrate is linearly moved under the proximity head. A single wafer cleaning system is also provided.
REFERENCES:
patent: 6230722 (2001-05-01), Mitsumori et al.
patent: 6446358 (2002-09-01), Mitsumori et al.
patent: 6488040 (2002-12-01), de Larios et al.
patent: 6491764 (2002-12-01), Mertens et al.
Boyd John M.
deLarios John
Wilcoxson Mark
Yun Seok-min
Lam Research Corporation
Martine & Penilla & Gencarella LLP
Perrin Joseph L
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