Enhanced remote plasma cleaning

Details Enhanced remote plasma cleaning Enhanced remote plasma cleaning

2005-03-22

2005-03-22

McDonald, Rodney G. (Department: 1753)

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

C134S001000, C134S001200, C134S001300, C134S05600D, C134S902000, C216S067000, C156S345240, C156S345350, C204S192320, C204S192350, C204S192360

Reexamination Certificate

active

06868856

ABSTRACT:
Methods and apparatus for cleaning semiconductor processing equipment. The apparatus include both local and remote gas dissociators coupled to a semiconductor processing chamber to be cleaned. The methods include introducing a precursor gas into the remote dissociator where the gas is dissociated and introducing a portion of the dissociated gas into the chamber. Another portion of the dissociated gas which re-associates before introduction into the chamber is also introduced into the chamber where it is again dissociated. The dissociated gas combines with contaminants in the chamber and is exhausted from the chamber along with the contaminants.

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