Enhanced cleansing process for wafer handling implements

Details Enhanced cleansing process for wafer handling implements Enhanced cleansing process for wafer handling implements

1995-04-13

1996-09-03

Bennett, Henry A.

Drying and gas or vapor contact with solids

Process

Gas or vapor pressure varies during treatment

34389, 34191, 34516, 34 92, 134902, F26B 504

Patent

active

055511651

ABSTRACT:
Methods are providing for cleansing contaminants from substrates, such as semiconductor wafer handling implements, and thereby reduce the incidence of contamination of semiconductor devices being assembled upon the semiconductor wafers. In one aspect of the invention, a substrate such as a semiconductor cassette or other semiconductor wafer handling implement, is inserted into a chamber that is substantially isolated from a surrounding environment. A pressurized, and optionally purified, cleansing medium is directed against at least one surface of the substrate to dislodge contaminants from the substrate surface. Dislodged contaminants are evacuated with negative pressure from the chamber. In a preferred aspect of the invention, the cleansing medium is an inert gas, such as nitrogen, and is applied to the substrate at a pressure from about 10 p.s.i. to about 100 or more p.s.i. The chamber can be provided with sidewalls define a convergent evacuation path that is in fluid communication with an exhaust stream, such as the exhaust stack of the manufacturing facility. A method of monitoring contaminant particle count and contaminant concentration which can be used to control the pressurized cleansing medium.

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patent: 5426865 (1995-06-01), Matsuo et al.

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