4. Cleaning and liquid contact with solids
  5. Processes
  6. Including use of vacuum, suction, or inert atmosphere

Hilario T. Trevino

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Cleansing process for wafer handling implements

Cleaning and liquid contact with solids – Processes – Including use of vacuum – suction – or inert atmosphere
Patent

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Enhanced cleansing process for wafer handling implements

Drying and gas or vapor contact with solids – Process – Gas or vapor pressure varies during treatment
Patent

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Enhanced high pressure cleansing system for wafer handling imple

Cleaning and liquid contact with solids – Apparatus – Automatic controls
Patent

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Profile ID: LFUS-PAI-P-552162

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