Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Electron beam imaging
Patent
1992-04-29
1995-08-08
Michl, Paul R.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Electron beam imaging
430270, 430311, 430313, 430323, 430325, 430326, 430330, G03C 500
Patent
active
054397804
ABSTRACT:
A class of silicon-containing materials display excellent sensitivity in the ultraviolet and deep ultraviolet for the formation of patterns by radiation induced conversion into glassy compounds. Materials are depositable from the vapor phase and show excellent promise for use such as resists in the fabrication of electronic and optical devices.
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Joshi Ajey M.
Weidman Timothy W.
AT&T Corp.
Hightower Pat
Michl Paul R.
Schneider Bruce S.
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