Energy sensitive materials and methods for their use

Details Energy sensitive materials and methods for their use Energy sensitive materials and methods for their use

1994-02-25

1997-06-03

Duda, Kathleen

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430322, 216 49, 438948, G03F 700

Patent

active

056353383

ABSTRACT:
A class of silicon-containing materials display excellent sensitively in the ultraviolet and deep ultraviolet for the formation of patterns by radiation induced conversion into glassy compounds. Materials are depositable from the vapor phase and show excellent promise for use such as resists in the fabrication of electronic and optical devices.

REFERENCES:
patent: 4283482 (1981-08-01), Hattori
Horn, "Plasma-deposited Organosilicon Thin Films as Dry Resists for Deep Ultraviolet Lithography", J. Vac. Sci. Technol.B 8(6), Nov./Dec. 1990, pp. 1493-1496.

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