Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1996-10-22
1998-03-10
Duda, Kathleen
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
430324, 430281, G03F 700
Patent
active
057259968
ABSTRACT:
A novel resist composition is disclosed. The resist composition is used in a lithographic process for device fabrication. The resist composition contains a polymer with phosphorus ester moieties. These moieties make the resist composition suitable for use in a variety of lithographic processes for fabricating integrated circuits.
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Houlihan Francis Michael
Katz Howard Edan
Schilling Marcia Lea
Botos Richard J.
Duda Kathleen
Lucent Technologies - Inc.
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