Endpoint detection for electro chemical mechanical polishing...

Electrolysis: processes – compositions used therein – and methods – Electrolytic erosion of a workpiece for shape or surface... – With measuring – testing – or sensing

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C204S22400M

Reexamination Certificate

active

06837983

ABSTRACT:
Systems and methods for detecting the endpoint of a polishing step. In general, an electropolishing system is provided with a power supply configured to deliver a current through an electrolytic solution. Signal characteristics of the signal provided by the power supply are monitored to determine a polishing endpoint. Illustratively, the monitored signal characteristics include current and voltage.

REFERENCES:
patent: 3162588 (1964-12-01), Bell
patent: 3448023 (1969-06-01), Bell
patent: 3873512 (1975-03-01), Latanision
patent: 4125444 (1978-11-01), Inoue
patent: 4713149 (1987-12-01), Hoshino
patent: 4793895 (1988-12-01), Kaanta et al.
patent: 4839993 (1989-06-01), Masuko et al.
patent: 4934102 (1990-06-01), Leach et al.
patent: 4954141 (1990-09-01), Takiyama et al.
patent: 4956056 (1990-09-01), Zubatova et al.
patent: 5096550 (1992-03-01), Mayer
patent: 5136817 (1992-08-01), Tabata et al.
patent: 5217586 (1993-06-01), Datta et al.
patent: 5225034 (1993-07-01), Yu et al.
patent: 5534106 (1996-07-01), Cote et al.
patent: 5543032 (1996-08-01), Datta et al.
patent: 5567300 (1996-10-01), Datta et al.
patent: 5575706 (1996-11-01), Tsai et al.
patent: 5578362 (1996-11-01), Reinhardt et al.
patent: 5624300 (1997-04-01), Kishii et al.
patent: 5738574 (1998-04-01), Tolles et al.
patent: 5804507 (1998-09-01), Perlov et al.
patent: 5807165 (1998-09-01), Uzoh et al.
patent: 5846882 (1998-12-01), Birang
patent: 5871392 (1999-02-01), Meikle et al.
patent: 5893796 (1999-04-01), Birang et al.
patent: 5911619 (1999-06-01), Uzoh et al.
patent: 5931719 (1999-08-01), Nagahara et al.
patent: 5938801 (1999-08-01), Robinson
patent: 6001008 (1999-12-01), Fujimori et al.
patent: 6004880 (1999-12-01), Liu et al.
patent: 6010395 (2000-01-01), Nakajima
patent: 6017265 (2000-01-01), Cook et al.
patent: 6020264 (2000-02-01), Lustig et al.
patent: 6024630 (2000-02-01), Shendon et al.
patent: 6066030 (2000-05-01), Uzoh
patent: 6090239 (2000-07-01), Liu et al.
patent: 6103096 (2000-08-01), Datta et al.
patent: 6116998 (2000-09-01), Damgaard et al.
patent: 6153043 (2000-11-01), Edelstein et al.
patent: 6156124 (2000-12-01), Tobin
patent: 6159079 (2000-12-01), Zuniga et al.
patent: 6171467 (2001-01-01), Weihs et al.
patent: 6176992 (2001-01-01), Talieh
patent: 6210257 (2001-04-01), Carlson
patent: 6234870 (2001-05-01), Uzoh et al.
patent: 6238271 (2001-05-01), Cesna
patent: 6244935 (2001-06-01), Birang et al.
patent: 6248222 (2001-06-01), Wang
patent: 6273798 (2001-08-01), Berman
patent: 6297159 (2001-10-01), Paton
patent: 6328872 (2001-12-01), Talieh et al.
patent: 6368184 (2002-04-01), Beckage
patent: 6368190 (2002-04-01), Easter et al.
patent: 6381169 (2002-04-01), Bocian et al.
patent: 6386956 (2002-05-01), Sato et al.
patent: 6391166 (2002-05-01), Wang
patent: 6395152 (2002-05-01), Wang
patent: 6402591 (2002-06-01), Thornton
patent: 6406363 (2002-06-01), Xu et al.
patent: 6409904 (2002-06-01), Uzoh et al.
patent: 6413388 (2002-07-01), Uzoh et al.
patent: 6413403 (2002-07-01), Lindquist et al.
patent: 6440295 (2002-08-01), Wang
patent: 6447668 (2002-09-01), Wang
patent: 6471847 (2002-10-01), Talieh et al.
patent: 6482307 (2002-11-01), Ashjaee et al.
patent: 6497800 (2002-12-01), Talieh et al.
patent: 6630059 (2003-10-01), Uzoh et al.
patent: 6638863 (2003-10-01), Wang et al.
patent: 6726823 (2004-04-01), Wang et al.
patent: 20010005667 (2001-06-01), Tolles et al.
patent: 20010024878 (2001-09-01), Nakamura
patent: 20010027018 (2001-10-01), Molnar
patent: 20010035354 (2001-11-01), Ashjaee et al.
patent: 20010036746 (2001-11-01), Sato et al.
patent: 20010040100 (2001-11-01), Wang
patent: 20010042690 (2001-11-01), Talieh
patent: 20020008036 (2002-01-01), Wang
patent: 20020011417 (2002-01-01), Talieh et al.
patent: 20020020621 (2002-02-01), Uzoh et al.
patent: 20020025760 (2002-02-01), Lee et al.
patent: 20020025763 (2002-02-01), Lee et al.
patent: 20020070126 (2002-06-01), Sato
patent: 20020077037 (2002-06-01), Tietz
patent: 20020088715 (2002-07-01), Talieh et al.
patent: 20020108861 (2002-08-01), Emesh et al.
patent: 20020119286 (2002-08-01), Chen et al.
patent: 20020130049 (2002-09-01), Chen et al.
patent: 20030016446 (2003-01-01), Duboust et al.
patent: 20030114087 (2003-06-01), Duboust et al.
patent: 20030116445 (2003-06-01), Sun et al.
patent: 20030116446 (2003-06-01), Duboust et al.
patent: 20030213703 (2003-11-01), Wang et al.
patent: 0 325 753 (1989-08-01), None
patent: 0 455 455 (1991-06-01), None
patent: 1103346 (2001-05-01), None
patent: 10-16213 (1998-01-01), None
patent: 2870537 (1999-01-01), None
patent: 11-042554 (1999-02-01), None
patent: 2000-218513 (2000-08-01), None
patent: 2001-77117 (2001-03-01), None
patent: P2001-77117 (2001-03-01), None
patent: 2001-244223 (2001-09-01), None
patent: 9849723 (1998-11-01), None
patent: WO-1998-49723 (1998-11-01), None
patent: WO-1999-41434 (1999-08-01), None
patent: WO 9953119 (1999-10-01), None
patent: WO-1999-53119 (1999-10-01), None
patent: WO-2000-03426 (2000-01-01), None
patent: WO-2000-26443 (2000-05-01), None
patent: WO-2000-33356 (2000-06-01), None
patent: WO-2000-59682 (2000-10-01), None
patent: WO-2001-13416 (2001-02-01), None
patent: WO-2001-49452 (2001-07-01), None
patent: WO-2001-52307 (2001-07-01), None
patent: WO-2001-63018 (2001-08-01), None
patent: WO-2001-71066 (2001-09-01), None
patent: WO-2001-88229 (2001-11-01), None
patent: WO-2001-88954 (2001-11-01), None
patent: WO 0223616 (2002-03-01), None
patent: WO-2002-23616 (2002-03-01), None
patent: 02064314 (2002-08-01), None
patent: WO-2002-64314 (2002-08-01), None
patent: 03001581 (2003-01-01), None
patent: WO-2003-001581 (2003-01-01), None
PCT Written Opinion for PCT/US03/01760 dated Mar. 8, 2004 (AMAT/6339.PC).
Alexander, et al., “Electrically Conductive Polymer Nanocomposite Materials,” www.afrlhorizons.com/Briefs/Sept02/ML0206.html, Date Unknown.
PCT International Search Report for PCT/US03/29230 dated Feb. 3, 2004 (AMAT/6874.PC).
Nogami “An Innovation to Integrate Porous Low-K Materials and Copper”,InterConnect Japan 2001; Honeywell Seminar (Dec. 6, 2001); pp. 1-12.
Contolini et al. “Electrochemical Planarization of ULSI Copper,”Solid State Technology; vol. 40, No. 6, Jun. 1, 1997, pp. 155-156, 158, 160, 162.
PCT Search Report dated May 27, 2003.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Endpoint detection for electro chemical mechanical polishing... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Endpoint detection for electro chemical mechanical polishing..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Endpoint detection for electro chemical mechanical polishing... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3374186

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.