Optics: measuring and testing – With plural diverse test or art
Patent
1996-12-06
1998-05-05
Evans, F. L.
Optics: measuring and testing
With plural diverse test or art
356316, 1566261, G01N 2162
Patent
active
057482977
ABSTRACT:
An apparatus used for detecting the endpoint or described completion point of an etching process has a detection window, an optical cable, and a bracket for fixedly holding the detection window and the optical cable with respect to each other. The detection window protrudes outwardly from a wall of a reaction chamber. The optical cable transmits light generated during an etching process from the detection window to a detecting device separate from the detection chamber. The bracket is attached to the wall of the reaction chamber so as to configure a space between the bracket and the detection window. The configuration reduces the intensity of the electric field formed between the bracket and plasma in the reaction chamber.
REFERENCES:
patent: 5290383 (1994-03-01), Koshimizu
Kim Chang-Sik
Park Jin-Ho
Park Shin-Hyun
Suk Jong-Wook
Evans F. L.
Samsung Electronics Co,. Ltd.
LandOfFree
Endpoint detecting apparatus in a plasma etching system does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Endpoint detecting apparatus in a plasma etching system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Endpoint detecting apparatus in a plasma etching system will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-60250