Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate
2007-07-17
2007-07-17
Lebentritt, Michael (Department: 2812)
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
Having insulated gate
C438S240000, C438S241000, C438S250000, C438S253000, C438S393000, C438S396000, C257S301000, C257SE21247
Reexamination Certificate
active
11264999
ABSTRACT:
An embedded capacitor structure in a circuit board and a method for fabricating the same are proposed. The circuit board is formed with a first circuit layer on at least one surface thereof, wherein the first circuit layer has at least one first electrode plate for the capacitor structure. Then, a dielectric layer is formed on the first circuit layer and made flush with the first circuit layer. The dielectric layer has a relatively low dielectric constant and good fluidity to effectively fill the spaces between patterned traces of the first circuit later. A capacitive material is deposited on the dielectric layer and the first circuit layer. Finally, a second circuit layer is formed on the capacitive material and has at least one second electrode plate corresponding to the first electrode plate, together with the capacitive material disposed in-between, to form the capacitor structure.
REFERENCES:
patent: 6967138 (2005-11-01), Ding
patent: 2005/0081349 (2005-04-01), Chang
Fulbright & Jaworski L.L.P.
Lebentritt Michael
Lee Kyoung
Phoenix Precision Technology Corporation
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