Ellipsometric method and apparatus for studying physical propert

Optics: measuring and testing – By polarized light examination – Of surface reflection

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350394, G01N 2121, G01J 400

Patent

active

046555951

ABSTRACT:
In an ellipsometric method and apparatus which, in order to increase the degree of measuring accuracy, uses the principle of comparative ellipsometry in measuring a characteristic such as a layer thickness, a reference surface is divided into first and second equal surface portions with respectively different reflection characteristics which are in substantially symmetrical relationship to the reflection characteristics of the testpiece, the surface portions preferably comprising two different tapering surface layers extending in parallel relationship to each other.

REFERENCES:
patent: 4332476 (1982-06-01), Stenberg et al.

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