Element having improved adhesion of auxiliary layers to film sup

Details Element having improved adhesion of auxiliary layers to film sup Element having improved adhesion of auxiliary layers to film sup

1992-01-07

1992-07-07

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430523, 430527, 430528, 430529, 430531, 430533, 428414, 428522, 428913, G03C 176

Patent

active

051282330

ABSTRACT:
A film support having an auxiliary layer coated over an antistatic layer coated on one side thereof is described. This element, which is particularly useful for the application of subsequently applied photosensitive layers on side opposite said auxiliary layer, comprises gelatin, a crosslinking agent, optionally a conductive polymer and an adhesion promoting amount of an adhesion agent, said adhesion agent selected from the group consisting of: compounds containing at least one --NH.sub.2 group and compounds containing at least two --NH groups, wherein said adhesion agent is sufficiently soluble in water that said adhesion promoting amount of adhesion agent may be dissolved in the dispersion used to coat said auxiliary layer, with the proviso that said adhesion agent is not malonamide. Preferred adhesion agents are urea, thiourea and 2-imidazolidone. Improved adhesion of the auxiliary layer to the antistatic layer is achieved.

REFERENCES:
patent: 4571379 (1986-02-01), Yamazaki et al.
patent: 4585730 (1986-04-01), Cho
patent: 4859570 (1989-08-01), Miller
patent: 4863801 (1989-09-01), Vallarino
patent: 4891308 (1990-01-01), Cho
patent: 4940655 (1990-07-01), Gundlach

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