Electrostatic deflection system with low aberrations and...

Radiant energy – With charged particle beam deflection or focussing – Magnetic lens

Reexamination Certificate

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C250S311000, C250S397000, C250S398000

Reexamination Certificate

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07315029

ABSTRACT:
Embodiments of the present invention may be utilized to improve electron beam deflection. One embodiment provides an electrostatic deflection system with electrodes that minimize aberrations and to achieve vertical incidence simultaneously. By using at least two stages of deflection for a deflection direction, the present invention allows the deflected electron beam to pass a back focal plane of an objective lens while deflection capacitors are not disposed across the back focal plane. As a result, deflection electrodes can have an angle of 120° to minimize aberrations and simultaneously achieve vertical incidence of the electron beam on a target to avoid distortions or changes in magnification with height variations of the target or focus variations.

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patent: 6509568 (2003-01-01), Ooae et al.
patent: 6617580 (2003-09-01), Voelkl
patent: 6825476 (2004-11-01), Adamec
patent: 6828573 (2004-12-01), Kawano et al.
patent: 6870172 (2005-03-01), Mankos et al.
patent: 2004/0119021 (2004-06-01), Parker et al.
patent: 2005/0133733 (2005-06-01), Nakasuji et al.

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