Electrostatic chuck and plasma apparatus equipped therewith

Details Electrostatic chuck and plasma apparatus equipped therewith Electrostatic chuck and plasma apparatus equipped therewith

1991-07-17

1993-10-19

Gaffin, Jeffrey A.

Electricity: electrical systems and devices

Electric charge generating or conducting means

Use of forces of electric charge or field

361235, H02N 1300

Patent

active

052551539

ABSTRACT:
An electrostatic chuck having an electrostatic holding member arranged on an upper surface of the chuck main body for holding a semiconductor device during a plasma etching process. The electrostatic holding member includes a pair of insulating polyimide members and a conductive member interposed between the polyimide members. In operation, a voltage is applied to the first conductive member in order to generate static electricity to be applied to the electrostatic holding member for holding the semiconductor device.

REFERENCES:
patent: 4384918 (1983-05-01), Abe
patent: 4645218 (1987-02-01), Ooshio et al.
patent: 4667110 (1987-05-01), Kariya
patent: 5151845 (1992-09-01), Watanabe et al.

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