Electrostatic chuck

Electricity: electrical systems and devices – Electric charge generating or conducting means – Use of forces of electric charge or field

Reexamination Certificate

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Reexamination Certificate

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10853773

ABSTRACT:
The electrostatic chuck includes: a conductive base formed of metal or both metal and ceramics, serving as a chucking electrode; and an insulating film formed on one principal plane of the conductive base, the top face of the insulating film serving as a placing surface for placing a wafer; wherein the insulating film is formed of a uniform amorphous ceramics of an oxide and has a thickness in a range of 10 to 100 μm, thereby preventing cracking and insulation breakdown in the insulating film and improving characteristics of releasing the wafer.

REFERENCES:
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patent: 5478456 (1995-12-01), Humpal et al.
patent: 6133557 (2000-10-01), Kawanabe et al.
patent: 6197151 (2001-03-01), Kaji et al.
patent: 6277506 (2001-08-01), Okamoto
patent: 58-123381 (1983-07-01), None
patent: 59-092782 (1984-05-01), None
patent: 04-049879 (1992-02-01), None
patent: 04-287344 (1992-10-01), None
patent: 08-288379 (1996-11-01), None
patent: 08288376 (1996-11-01), None
patent: 11-265930 (1999-09-01), None

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