Electricity: electrical systems and devices – Electric charge generating or conducting means – Use of forces of electric charge or field
Reexamination Certificate
2007-12-25
2007-12-25
Sherry, Michael (Department: 2836)
Electricity: electrical systems and devices
Electric charge generating or conducting means
Use of forces of electric charge or field
Reexamination Certificate
active
10853773
ABSTRACT:
The electrostatic chuck includes: a conductive base formed of metal or both metal and ceramics, serving as a chucking electrode; and an insulating film formed on one principal plane of the conductive base, the top face of the insulating film serving as a placing surface for placing a wafer; wherein the insulating film is formed of a uniform amorphous ceramics of an oxide and has a thickness in a range of 10 to 100 μm, thereby preventing cracking and insulation breakdown in the insulating film and improving characteristics of releasing the wafer.
REFERENCES:
patent: 4786467 (1988-11-01), Skibo et al.
patent: 5447908 (1995-09-01), Itozaki et al.
patent: 5478456 (1995-12-01), Humpal et al.
patent: 6133557 (2000-10-01), Kawanabe et al.
patent: 6197151 (2001-03-01), Kaji et al.
patent: 6277506 (2001-08-01), Okamoto
patent: 58-123381 (1983-07-01), None
patent: 59-092782 (1984-05-01), None
patent: 04-049879 (1992-02-01), None
patent: 04-287344 (1992-10-01), None
patent: 08-288379 (1996-11-01), None
patent: 08288376 (1996-11-01), None
patent: 11-265930 (1999-09-01), None
Bauer Scott
Hogan & Harston LLP
Kyocera Corporation
Sherry Michael
LandOfFree
Electrostatic chuck does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Electrostatic chuck, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electrostatic chuck will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3836216