Electrostatic chuck

Electricity: electrical systems and devices – Electric charge generating or conducting means – Use of forces of electric charge or field

Patent

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Details

279128, H02N 1300

Patent

active

051518457

ABSTRACT:
An electrostatic chuck for electrostatically attracting and holding an object such as a semiconductor wafer includes a base plate, at least two layers each including an electrically insulating film and an electrode attached to a lower surface thereof, the at least two layers being disposed as attractive layers on the base plate, and a voltage applying assembly for selectively applying a voltage to at least one of the electrodes to electrostatically attract the object to the insulating film of an uppermost one of the layers. The insulating films may have different insulation resistances to allow for a wider range of temperature changes.

REFERENCES:
patent: 4692836 (1987-09-01), Suzuki

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