Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – On insulating substrate or layer
Patent
1996-03-26
2000-06-27
Elms, Richard
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
On insulating substrate or layer
438152, 438160, 438586, 430126, H01L 2100, H01L 2120
Patent
active
060806060
ABSTRACT:
Amorphous silicon thin-film transistors on glass foil are made using exclusively electrophotographic printing for pattern formation, contact hole opening, and device isolation. Toner etch masks are applied by feeding the glass substrate through a laser printer or photocopier, or from laser-printed patterns on transfer paper. This all-printed patterning is a low-cost, large-area circuit processing technology, suitable for producing backplanes for active matrix liquid crystal displays.
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Gleskova Helena
Shen Dashen
Wagner Sigurd Richard
Elms Richard
Lebentritt Michael S.
The Trustees of Princeton University
Watov Kenneth
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