Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate
2005-02-08
2005-02-08
Chen, Jack (Department: 2813)
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
Having insulated gate
C438S258000
Reexamination Certificate
active
06852596
ABSTRACT:
An electronic memory circuit comprises a matrix of EEPROM memory cells. Each memory cell includes a MOS floating gate transistor and a selection transistor. The matrix includes a plurality of rows and columns, with each row being provided with a word line and each column comprising a bit line organized in line groups so as to group the matrix cells in bytes, each of which has an associated control gate line. A pair of cells have a common source region, and each cell symmetrically provided with respect to this common source region has a common control gate region.
REFERENCES:
patent: 4379343 (1983-04-01), Moyer
patent: 4380057 (1983-04-01), Kotecha et al.
patent: 5066992 (1991-11-01), Wu et al.
patent: 5471423 (1995-11-01), Iwasa
patent: 5646886 (1997-07-01), Brahmbhatt
patent: 5677871 (1997-10-01), Pio et al.
patent: 5798547 (1998-08-01), Urai
patent: 5981340 (1999-11-01), Chang et al.
patent: 5982669 (1999-11-01), Kalnitsky et al.
patent: 5986934 (1999-11-01), Kao et al.
patent: 0996161 (2000-04-01), None
patent: 61 256673 (1986-11-01), None
patent: 8 316438 (1996-11-01), None
Allen Dyer Doppelt Milbrath & Gilchrist, P.A.
Chen Jack
Jorgenson Lisa K.
STMicroelectronics S.r.l.
LandOfFree
Electronic memory circuit and related manufacturing method does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Electronic memory circuit and related manufacturing method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electronic memory circuit and related manufacturing method will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3471620