Electron lithography using a photocathode

Details Electron lithography using a photocathode Electron lithography using a photocathode

1992-12-29

1995-03-07

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

430942, 437935, F03C 500

Patent

active

053957385

ABSTRACT:
Sub-micron pattern delineation, importantly in the fabrication of large scale integrated devices, is based on a patterned photocathode. Functionally, the photocathode plays the role of the mask in competing systems, either in proximity printing or in projection. In operation, the photocathode is illuminated by ultraviolet radiation to release electrons which are brought to focus on a resist-coated wafer with assistance of a uniform magnetic field together with an accelerating applied voltage.

REFERENCES:
patent: 3806756 (1974-04-01), Low et al.
patent: 4350919 (1982-09-01), Johnson et al.
patent: 4746587 (1988-05-01), Nicholas
patent: 5156942 (1992-10-01), Aton et al.
T. W. P. Chang et al., "Electron-Beam Lithography Draws a Finer Line", Electronics, May 12, 1977, pp. 89-98.
J. E. Bjorkholm et al, J. Vac. Sci. Technology, v. B8, p. 1509 (1990).
E-beam Technology, Brewer, ed., chap. by J. Trotel and B. Fay, pp. 325-335 (1980).
S. D. Berger, et al., J. Vac. Sci. Technology, v. B9(6), p. 2996 (1991).
G. K. Celler et al, Applied Physics Letters, v. 59, 3105 (1991).
IEEE Transactions on Electron Devices, v. ED-22, No. 7 (Jul. 1975).
J. Vac. Sci. Technology, v. B4(1), pp. 89-93 (Jan./Feb. 1986).

Affiliated with

Also associated with

Rating

Electron lithography using a photocathode does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Electron lithography using a photocathode, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electron lithography using a photocathode will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1405333