Electron exposure to reduce line edge roughness

Details Electron exposure to reduce line edge roughness Electron exposure to reduce line edge roughness

2008-03-25

2008-03-25

Young, Christopher G. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

C430S327000, C430S328000, C430S330000, C430S942000

Reexamination Certificate

active

11078575

ABSTRACT:
The present invention describes a method including providing a substrate; forming a photoresist on the substrate; performing a post-apply bake on the photoresist; exposing the photoresist to actinic radiation; performing a post-exposure bake on the photoresist; developing the photoresist; and performing electron exposure on the photoresist to reduce line edge roughness.

REFERENCES:
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patent: 6340556 (2002-01-01), Wong
patent: 6358670 (2002-03-01), Wong et al.
patent: 6420097 (2002-07-01), Pike et al.
patent: 6589709 (2003-07-01), Okoroanyanwu et al.
patent: 6753129 (2004-06-01), Livesay et al.
patent: 2002/0022195 (2002-02-01), Nakano et al.
patent: 2004/0152024 (2004-08-01), Livesay et al.

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