Electron beam system and method of manufacturing devices...

Radiant energy – Inspection of solids or liquids by charged particles – Electron microscope type

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C250S310000, C250S492200

Reexamination Certificate

active

11034873

ABSTRACT:
An electron beam system wherein a shot noise of an electron beam can be reduced and a beam current can be made higher, and further a shaped beam is formed by a two-stage lenses so as to allow for an operation with high stability. In this electron beam system, an electron beam emitted from an electron gun is irradiated onto a sample and secondary electrons emanated from the sample are detected. The electron gun is a thermionic emission type and designed to operate in a space charge limited condition. A shaping aperture and a NA aperture are arranged in front locations of the electron gun. An image of the shaping aperture formed by an electron beam emitted from the thermionic emission electron gun is focused onto a surface of the sample through the two-stage lenses.

REFERENCES:
patent: 5359197 (1994-10-01), Komatsu et al.
patent: 5892224 (1999-04-01), Nakasuji
patent: 5973332 (1999-10-01), Muraki et al.
patent: 6087667 (2000-07-01), Nakasuji et al.
patent: 6310341 (2001-10-01), Todokoro et al.
patent: 6365897 (2002-04-01), Hamashima et al.
patent: 6476390 (2002-11-01), Murakoshi et al.
patent: 6555816 (2003-04-01), Sawahata et al.
patent: 6583413 (2003-06-01), Shinada et al.
patent: 6593152 (2003-07-01), Nakasuji et al.
patent: 2002/0088940 (2002-07-01), Watanabe et al.
patent: 2002/0148961 (2002-10-01), Nakasuji et al.
patent: 0 366 005 (1990-05-01), None
patent: 2002-195964 (2002-07-01), None
B.J. Thompson et al., “Fluctuations in Space-Charge-Limited Currents at Moderately High Frequencies” RCA Review 4 (1940), pp. 441-472.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Electron beam system and method of manufacturing devices... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Electron beam system and method of manufacturing devices..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electron beam system and method of manufacturing devices... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3883057

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.